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Product Description
The YYKJ-1500HW gas generation equipment is specifically tailored for CVD/ALD operations. It efficiently handles hazardous gases including SiH4, SiHCl3, HCl, DCS, TEOS, and TMA. Featuring electric heating for water washing, it ensures high-efficiency purification. With scalable capacities of 500L, 700L, and 1500L, it incorporates 4 inlet ports for versatile gas input and purging with Hot N2 at 200-300 L/min, distributed across 8 control ports.
| TECHNICAL PARAMETERS |
SPECIFICATIONS |
| Product Name |
Local Scrubber |
| Model |
YYKJ-1500HW |
| Power |
Rated / Actual |
208/380VAC, 3 ph, 50/60Hz |
| CDA |
300 ~ 600LPM |
(4 ~ 6 kg/cm2) |
| N2 (Hot) |
200 ~ 300 MAX LPM; 25 ~ 30LPM x 8 Port |
| Drainage Method |
Pump discharge |
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Plasma Water Scrubber Features
🔹 High Efficiency Exhaust Treatment
Integrates plasma technology with water scrubbing to remove complex volatile organic compounds (VOCs) and acidic/alkaline gases. Processing efficiency reaches 99% for general gases and 98% for NF3.
🔹 High Humidity Tolerance & Energy Saving
Maintains stable performance under high humidity. Low-temperature plasma technology consumes minimal energy. Water systems utilize recirculation to minimize waste.
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Frequently Asked Questions
Which gases can this purification equipment handle?
The system is designed to process a wide range of gases including SiH4, SiHCl3, HCl, DCS, TEOS, TMA, SF6, CF4, CHF3, NF3, and PH3.
What is the gas processing efficiency?
The equipment achieves a general gas processing efficiency of 99%, with specific efficiency for NF3 reaching 98%.
Does the system require a warm-up period?
No, the equipment features smart automation that allows it to operate immediately upon powering on, making it ideal for intermittent production.
Is the plasma technology affected by high humidity?
The low-temperature plasma technology used maintains stable performance even under high humidity conditions, ensuring reliable scrubbing in damp environments.
What are the main application fields for this equipment?
It is primarily used in semiconductor manufacturing (CVD/ALD/PECVD), photovoltaics, optoelectronics, and chemical coating applications.
What is the annual production capacity for this equipment?
The facility has an annual delivery capacity of 5,000 units, supported by four digital workshops.
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